谢玉芳

发布日期:2024-09-09浏览次数:


个人简介:谢玉芳,资格副教授,硕士生导师。2021年于德国德累斯顿工业大学获理学博士(Dr.rer.nat.)学位。主要研究方向为外延薄膜的制备、磁学和电学性质以及器件微加工制备等。迄今为止共发表SCI论文23篇,其中以第一作者/通讯作者身份发表6篇,论文累计引用400余次。

讲授课程:集成电路分析与设计(本科生)、集成电路设计与EDA(硕士生)、集成电路设计实验(本科生)、大学物理实验(本科生)

Email: yufang_xie@ujs.edu.cn

研究领域与招生专业
研究领域:磁学及自旋电子学、功能薄膜与器件
招生专业:物理学、集成电路科学与工程

科研项目
1.国家自然科学基金青年基金,反铁磁Mn(3+x)Ge(1-x)外延薄膜的可控制备及反常输运机制研究,12304143,在研,主持
2.“博后海外引才专项计划”人才项目,在研,主持

3.江苏大学高级人才启动基金,外延薄膜的制备及反常输运性能研究,22JDG043,在研,主持

学术论文与专著
代表性学术论文:
◆ 外延薄膜的磁学及输运机制研究
1.Y. Xie*, Y. Yuan, M. Birowska, C. Zhang, L. Cao, M. Wang, J. Grenzer, D. Kriegner, P. Dolezal, Y. Zeng, X. Zhang, M. Helm, S. Zhou, S. Prucnal*. Strain induced switching between non-collinear and collinear spin configuration in magnetic Mn5Ge3 film, Phys. Rev. B 104, 064416 (2021).

2.Y. Xie*, Y. Yuan*, M. Wang, C. Xu, R. Huebner, J. Grenzer, Y. Zeng, M. Helm, S. Zhou, and S. Prucnal. Epitaxial Mn5Ge3 (100) layer on Ge (100) substrates obtained by flash lamp annealing, Appl. Phys. Lett. 113, 222401 (2018).
3.Y. Xie*, M. Birowska, H. S. Funk, C. Xu, Y. Zeng, M. Helm, S. Zhou, and S. Prucnal*. Tunning of Curie temperature in Mn5Ge3 films, J. Appl. Phys. 131, 105102 (2022).
4.Y. Xie*, Z. Li, V. Begeza, Y. Zeng, M. Helm, S. Zhou, and S. Prucnal*. Influence of fabrication parameters on the magnetic and structural properties of Mn5Ge3, Semicond. Sci. Technol. 37, 065009 (2022).
5.Z. Li*, Y. Xie, Y. Yuan*, Y. Ji, V. Begeza, L. Cao, R. Hübner, L. Rebohle, M. Helm, K. Nielsch, S. Prucnal, S. Zhou*. Phase Selection in Mn-Si Alloys by Fast Solid-State Reaction with Enhanced Skyrmion Stability, Adv. Funct. Mater. 31, 2009723 (2021).
6.Z. Li*, Y. Xie, Y. Yuan, M. Wang, C. Xu, R. Hübner, S. Prucnal, and S. Zhou*. B20-type FeGe on Ge (100) prepared by pulsed laser melting, J. Magn. Magn. Mater. 532, 167981 (2021).
◆ 电子器件的构筑
7.Y. Xie, K. Javaid, J. Gao, H. Zhang, L. Liang*, F. Zhuge, H. Cao*, L. Wang, and Y. Lu. Combined control of cation and anion to make ZnSnON thin films for visible-light phototransistors with high responsivity, J. Mater. Chem. C. 5, 6480 (2017).
8.K. Javaid, Y. Xie, H. Luo, M. Wang, H. Zhang, J. Gao, F. Zhuge, L. Liang, H. Cao. The electrical properties of n-ZnO/p-SnO heterojunction diodes, Appl. Phys. Lett. 109, 123507 (2016)
◆ 铁电薄膜材料设计及典型器件应用
9.J. Yang, Y. Xie*, C. Zhu, S. Chen, J. Wei, Y. Liu, M. Chen, D. Cao*. Enhancing ferroelectric performance in hafnia-based MFIS capacitor through interface passivation and bulk doping, Nanotechnology 35, 235704 (2024).

授权专利
1.梁凌燕、谢玉芳、曹鸿涛、吴卫华、张胜男、王妹,薄膜晶体管及其制备方法和显示装置,2018.08.28,中国,ZL201610226727.0
2.梁凌燕、谢玉芳、曹鸿涛,薄膜晶体管及制备方法和交互式显示装置,2019.01.11,中国,ZL201610670245.4

表彰奖励