个人简介:谢玉芳,副教授,硕士生导师。于德国德累斯顿工业大学获理学博士(Dr.rer.nat.)学位。主要研究兴趣为后摩尔集成电路功能薄膜与器件及电路设计。以第一作者/通讯作者身份发表学术论文7篇,累计引用700余次。入选江苏大学金山英才青年骨干教师培育计划(2025)。
讲授课程:集成电路分析与设计(本科生)、集成电路设计与EDA(硕士生)、集成电路设计实验(本科生)、大学物理实验(本科生)
Email: yufang_xie@ujs.edu.cn
研究领域与招生专业研究领域:磁学及自旋电子学、功能薄膜与器件招生专业:物理学、集成电路科学与工程
科研项目1.国家自然科学基金青年基金,反铁磁Mn(3+x)Ge(1-x)外延薄膜的可控制备及反常输运机制研究,12304143,在研,主持2.教育部博士后专项,在研,主持
3.江苏大学高级人才启动基金,外延薄膜的制备及反常输运性能研究,22JDG043,在研,主持
学术论文与专著代表性学术论文:◆ 外延薄膜的磁学及输运机制研究1.Y. Xie*, Y. Yuan, M. Birowska, C. Zhang, L. Cao, M. Wang, J. Grenzer, D. Kriegner, P. Dolezal, Y. Zeng, X. Zhang, M. Helm, S. Zhou, S. Prucnal*. Strain induced switching between non-collinear and collinear spin configuration in magnetic Mn5Ge3 film, Phys. Rev. B 104, 064416 (2021).
2.Y. Xie*, Y. Yuan*, M. Wang, C. Xu, R. Huebner, J. Grenzer, Y. Zeng, M. Helm, S. Zhou, and S. Prucnal. Epitaxial Mn5Ge3 (100) layer on Ge (100) substrates obtained by flash lamp annealing, Appl. Phys. Lett. 113, 222401 (2018).3.Y. Xie*, M. Birowska, H. S. Funk, C. Xu, Y. Zeng, M. Helm, S. Zhou, and S. Prucnal*. Tunning of Curie temperature in Mn5Ge3 films, J. Appl. Phys. 131, 105102 (2022).4.Y. Xie*, Z. Li, V. Begeza, Y. Zeng, M. Helm, S. Zhou, and S. Prucnal*. Influence of fabrication parameters on the magnetic and structural properties of Mn5Ge3, Semicond. Sci. Technol. 37, 065009 (2022).5.Z. Li*, Y. Xie, Y. Yuan*, Y. Ji, V. Begeza, L. Cao, R. Hübner, L. Rebohle, M. Helm, K. Nielsch, S. Prucnal, S. Zhou*. Phase Selection in Mn-Si Alloys by Fast Solid-State Reaction with Enhanced Skyrmion Stability, Adv. Funct. Mater. 31, 2009723 (2021).6.Z. Li*, Y. Xie, Y. Yuan, M. Wang, C. Xu, R. Hübner, S. Prucnal, and S. Zhou*. B20-type FeGe on Ge (100) prepared by pulsed laser melting, J. Magn. Magn. Mater. 532, 167981 (2021).◆ 电子器件的构筑7.Y. Xie, K. Javaid, J. Gao, H. Zhang, L. Liang*, F. Zhuge, H. Cao*, L. Wang, and Y. Lu. Combined control of cation and anion to make ZnSnON thin films for visible-light phototransistors with high responsivity, J. Mater. Chem. C. 5, 6480 (2017).8.K. Javaid, Y. Xie, H. Luo, M. Wang, H. Zhang, J. Gao, F. Zhuge, L. Liang, H. Cao. The electrical properties of n-ZnO/p-SnO heterojunction diodes, Appl. Phys. Lett. 109, 123507 (2016)◆ 铁电薄膜材料设计及典型器件应用9.J. Yang, Y. Xie*, C. Zhu, S. Chen, J. Wei, Y. Liu, M. Chen, D. Cao*. Enhancing ferroelectric performance in hafnia-based MFIS capacitor through interface passivation and bulk doping, Nanotechnology 35, 235704 (2024).
授权专利1.梁凌燕、谢玉芳、曹鸿涛、吴卫华、张胜男、王妹,薄膜晶体管及其制备方法和显示装置,2018.08.28,中国,ZL201610226727.02.梁凌燕、谢玉芳、曹鸿涛,薄膜晶体管及制备方法和交互式显示装置,2019.01.11,中国,ZL201610670245.4
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